Work

Lithography‐Free, Self‐Aligned Inkjet Printing with Sub‐Hundred‐Nanometer Resolution

Year: 2005

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.200401285

Authors: C. W. Sele, T. von Werne, R. H. Friend, H. Sirringhaus

Institutions: University of Cambridge, Plastic Logic (United Kingdom)

Language: English

Topic: Nanomaterials and Printing Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2088096529

FWCI: 16.36

Cites: 21

Cited by: 311

Related to: 10