Work

Parallel silicide contacts

Year: 1980

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.328160

Authors: I. Ohdomari, K. N. Tu

Institution: IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2090958407

FWCI: 4.24

Cites: 5

Cited by: 212

Related to: 10