Progress in extreme ultraviolet interferometric and holographic lithography
Year: 2007
Type: article
DOI: 10.1116/1.2794069
Authors: A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, S. Bollepalli
Institutions: University of Wisconsin–Madison, Intel (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2093443357