Work

Optimization of Diblock Copolymer Thin Film Self Assembly

Year: 2002

Type: article

Source: Advanced Materials

DOI: 10.1002/1521-4095(20020916)14:18<1290::aid-adma1290>3.0.co;2-n

Authors: K.W. Guarini, C.T. Black, S.H.I. Yeung

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center, University of California, Berkeley

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2093912827

FWCI: 5.202

Cites:

Cited by: 182

Related to: 10