Work

Confinement of Threading Dislocations in Simox with a GeSi Strained Layer

Year: 1990

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-198-503

Authors: F. Namavar, E. Cortesi, D.L. Perry, E.A. Johnson, N.M. Kalkhoran, J.M. Manke, N.H. Karam, R.F. Pinizzotto, H. Yang

Institutions: Spire Corporation (United States), Purdue University West Lafayette, University of North Texas

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2099259202

FWCI: 0.221

Cites: 10

Cited by: 3

Related to: 10