Work

A micromachined sensor for in-situ monitoring of plasma etching

Year: 2002

Type: conference-paper

Source: Conference digest

DOI: 10.1109/drc.1996.546339

Authors: M.D. Baker, O. Brand, M.G. Allen, G.S. May

Institution: Georgia Institute of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Intel Corporation

OpenAlex ID: W2100756113

FWCI:

Cites: 1

Cited by: 1

Related to: 10