EL5: One tool for advanced x-ray and chrome on glass mask making
Year: 1998
Type: article
DOI: 10.1116/1.590457
Authors: M. A. Sturans, J. G. Hartley, H. C. Pfeiffer, R. S. Dhaliwal, T. R. Groves, J. W. Pavick, R. J. Quickle, C. S. Clement, G. J. Dick, W. A. Enichen, M. S. Gordon, R. A. Kendall, C. A. Kostek, D. J. Pinckney, C. F. Robinson, J. D. Rockrohr, J. M. Safran, J. J. Senesi, E. V. Tressler
Institution: IBM (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2101349433