Work

Run by run process control: combining SPC and feedback control

Year: 1995

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/66.350755

Authors: E. Sachs, A. Hu, A. Ingolfsson

Institutions: Massachusetts Institute of Technology, San Jose State University

Language: English

Topic: Advanced Statistical Process Monitoring

Subfield: Statistics, Probability and Uncertainty

Field: Decision Sciences

Domain: Social Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2104897439

FWCI: 18.23

Cites: 25

Cited by: 325

Related to: 10