Work

Defect Reduction and Defect Engineering in Silicon-on-Sapphire Material Using Ge Implantation

Year: 1990

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-201-337

Authors: F. Namavar, E. Cortesi, N. M. Kalkhoran, J. M. Manke, B. L. Buchanan

Institution: Spire Corporation (United States)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2105149665

FWCI:

Cites: 21

Cited by: 3

Related to: 10