Work

On Direct Measurement of Forces Between CMP Polishing Pads and Abrasive Nanoparticles

Year: 2005

Type: conference-paper

Source: World Tribology Congress (WTC)

DOI: 10.1115/wtc2005-64160

Authors: I. Sokolov, Q. K. Ong, N. Chechik, D. James

Institutions: Clarkson University, ROHM, Plastic Electronics (Netherlands)

Language: English

Topic: Force Microscopy Techniques and Applications

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2107377809

FWCI:

Cites:

Cited by: 1

Related to: 10