Work

“Dry” Lithography Using Liquid and Supercritical Carbon Dioxide Based Chemistries and Processes

Year: 2004

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2004.837002

Authors: E.N. Hoggan, K. Wang, D. Flowers, J.M. DeSimone, R.G. Carbonell

Institutions: Intel (United States), North Carolina State University, DuPont (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

OpenAlex ID: W2108460622

FWCI: 1.302

Cites: 22

Cited by: 19

Related to: 10