Work

Anomalous B penetration through ultrathin gate oxides during rapid thermal annealing

Year: 1999

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/55.784454

Author: R.B. Fair

Institution: Duke University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: North Carolina State University

OpenAlex ID: W2110072321

FWCI: 2.663

Cites: 15

Cited by: 12

Related to: 10