Work

Mechanical Property Characterization of LPCVD Silicon Nitride Thin Films at Cryogenic Temperatures

Year: 2004

Type: article

Source: Journal of Microelectromechanical Systems

DOI: 10.1109/jmems.2004.836815

Authors: W.-H. Chuang, T. Luger, R.K. Fettig, R. Ghodssi

Institution: University of Maryland, College Park

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Technische Universität Berlin, Goddard Space Flight Center

OpenAlex ID: W2111215451

FWCI: 4.579

Cites: 40

Cited by: 101

Related to: 10