Nonthermal pulsed laser annealing of Si; plasma annealing
Year: 1979
Type: article
Source: Physics Letters A
Authors: J.A. Van Vechten, R. Tsu, F.W. Saris
Institution: IBM Research - Thomas J. Watson Research Center
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2112913532