Work

Patterning with block copolymer thin films

Year: 2005

Type: article

Source: Materials Science and Engineering R Reports

DOI: 10.1016/j.mser.2004.12.003

Author: Rachel A. Segalman

Institutions: Lawrence Berkeley National Laboratory, University of California, Berkeley

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2114708340

FWCI: 27.39

Cites: 237

Cited by: 967

Related to: 10