Work

Stochastic Simulation of the Early Stages of Kinetically Limited Electrodeposition

Year: 2006

Type: article

Abstract: Kinetic Monte Carlo simulations are used to investigate nucleation and early stages of growth during metal electrodeposition at low overpotentials, where the kinetics of attachment of atoms to the electrode surface is rate-limiting. The surface diffusion energy barriers and deposition rate constants were varied to determine their effects on the deposition of metal onto a (111)-oriented facet of a face-centered cubic substrate material. The cluster density, average cluster size, and average cluster height were obtained from simulations. Over the range of parameters investigated here, the highest cluster densities were achieved when the metal-on-substrate surface diffusion rate was low relative to the metal-on-metal surface diffusion rate. It was found that the cluster density was highest after 0.3 equivalent monolayers had been deposited.

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2191167

Authors: Timothy O. Drews, Aleksandar Radisic, Jonah Erlebacher, Richard D. Braatz, Peter C. Searson, Richard C. Alkire

Institutions: University of Illinois Urbana-Champaign, National Center for Supercomputing Applications, Johns Hopkins University

Language: English

Topic: Electrodeposition and Electroless Coatings

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funders: National Science Foundation, University of Illinois at Urbana-Champaign

Awards: Additive Mediated Nucleation and Growth during Electrodeposition: High-throughput Experiments and Multiscale Simulation, Adsorbate Mediated Electrodeposition: Experimental and Multiscale Numerical Investigations on Surface Roughness and Shape Evolution, National Computational Science Alliance