Work

Cover Picture: Massively Parallel Dip–Pen Nanolithography with 55 000‐Pen Two‐Dimensional Arrays (Angew. Chem. Int. Ed. 43/2006)

Year: 2006

Type: article

Source: Angewandte Chemie International Edition

DOI: 10.1002/anie.200690148

Authors: Khalid Salaita, Yuhuang Wang, Joseph Fragala, Rafael A. Vega, Chang Liu, Chad A. Mirkin

Institutions: Northwestern University, International Institute for Nanotechnology, University of Illinois Urbana-Champaign

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2120211191

FWCI:

Cites:

Cited by: 2

Related to: 10