Selective Etching of Graphene Edges by Hydrogen Plasma
Year: 2010
Type: article
DOI: 10.1021/ja107071g
Authors: Liming Xie, Liying Jiao, Hongjie Dai
Institution: Stanford University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Funder: Office of Naval Research
OpenAlex ID: W2120607392
