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A new paradigm for high resolution 3D lithography

Year: 2008

Type: conference-paper

Source: Proceedings, IEEE micro electro mechanical systems

DOI: 10.1109/memsys.2008.4443676

Authors: L. A. Mosher, C. M. Waits, B. Morgan, R. Ghodssi

Institutions: University of Maryland, College Park, DEVCOM Army Research Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2125010355

FWCI: 0.474

Cites: 5

Cited by: 2

Related to: 10