Work

Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self‐Assembly

Year: 2008

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.200802024

Authors: Jonathan Germain, Marco Rolandi, Scott A. Backer, Jean M. J. Fréchet

Institutions: University of California, Berkeley, Lawrence Berkeley National Laboratory

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2126765907

FWCI: 1.989

Cites: 23

Cited by: 16

Related to: 10