Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: a model study
Year: 2002
Type: article
Source: Chemical Communications
DOI: 10.1039/b209695a
Institution: University of California, Berkeley
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2127758042