Work

Electron beam lithography in nanoscale fabrication: recent development

Year: 2003

Type: article

Source: IEEE Transactions on Electronics Packaging Manufacturing

DOI: 10.1109/tepm.2003.817714

Authors: A.A. Tseng, Kuan Chen, C.D. Chen, K.J. Ma

Institutions: Arizona State University, University of Utah, Orange (France), Chung Hua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2129216969

FWCI: 6.363

Cites: 19

Cited by: 534

Related to: 10