Work

Theory and Direct Measurement of Boron Segregation in SiO2 during Dry, Near Dry, and Wet O 2 Oxidation

Year: 1978

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2131361

Authors: Richard B. Fair, J. C. C. Tsai

Institution: AT&T (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2134939575

FWCI: 4.601

Cites:

Cited by: 48

Related to: 10