Low‐Pressure Chemical Vapor Deposition of α‐Si 3 N 4 from SiF 4 and NH 3 : Nucleation and Growth Characteristics
Year: 1992
Type: article
Authors: Woo Y. Lee, James R. Strife, Richard D. Veltri
Institutions: Oak Ridge National Laboratory, American Ceramic Society
Language: English
Subfield: Ceramics and Composites
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2140161970