Work

Antireflection behavior of silicon subwavelength periodic structures for visible light

Year: 1997

Type: article

Abstract: We describe subwavelength surfaces etched into silicon wafers that exhibit antireflection characteristics for visible light. The wafers are fabricated by holographically recording a crossed-grating in a photoresist mask followed by reactive-ion etching to transfer the primary mask onto the silicon substrate. The dependence of reflectivity on the wavelength and angle of incidence is measured. The overall antireflection performance of the corrugated silicon wafers is compared with that of standard thin-film stacks, and is interpreted with the effective medium theory and with simulation results obtained from rigorous computations.

Source: Nanotechnology

DOI: 10.1088/0957-4484/8/2/002

Authors: Philippe Lalanne, G Michael Morris

Institutions: Centre National de la Recherche Scientifique, Institut d’Optique Graduate School, University of Rochester

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

Funders: Novo Nordisk Fonden, Army Research Office

OpenAlex ID: W2141144756

FWCI: 2.763

Cites: 8

Cited by: 263

Related to: 10