Work

Optical and Interferometric Lithography - Nanotechnology Enablers

Year: 2005

Type: article

Source: Proceedings of the IEEE

DOI: 10.1109/jproc.2005.853538

Author: S.R.J. Brueck

Institution: University of New Mexico

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2141734849

FWCI: 12.72

Cites: 77

Cited by: 313

Related to: 10