Work

Nanostructuring of anti-adhesive layers by hot embossing lithography

Year: 2003

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(03)00078-9

Authors: Sunggook Park, Celestino Padeste, Helmut Schift, Jens Gobrecht

Institution: Paul Scherrer Institute

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2142607639

FWCI: 3.955

Cites: 6

Cited by: 28

Related to: 10