Work

High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies

Year: 2004

Type: article

Source: Angewandte Chemie International Edition

DOI: 10.1002/anie.200461122

Authors: Jason P. Rolland, Erik C. Hagberg, Ginger M. Denison, Kenneth R. Carter, Joseph M. De Simone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University, IBM Research - Almaden

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2144020819

FWCI: 7.157

Cites: 26

Cited by: 299

Related to: 10