Work

Surface Roughness in Plasma-Etched $\hbox{As}_{\bf 2}\hbox{S}_{\bf 3}$ Films: Its Origin and Improvement

Year: 2008

Type: article

Source: IEEE Transactions on Nanotechnology

DOI: 10.1109/tnano.2008.920165

Authors: Duk-Yong Choi, S. Madden, A. Rode, Rongping Wang, A. Ankiewicz, B. Luther-Davies

Institution: Australian National University

Language: English

Topic: Phase-change materials and chalcogenides

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2146796961

FWCI: 0.449

Cites: 23

Cited by: 7

Related to: 10