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New approaches in optical lithography technology for subwavelength resolution

Year: 2005

Type: article

Author: Hoyoung Kang

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2147282201

FWCI:

Cites: 69

Cited by:

Related to: 10