Optimal control of rapid thermal annealing in a semiconductor process
Year: 2003
Type: article
Source: Journal of Process Control
Authors: R. Gunawan, M.Y.L. Jung, E.G. Seebauer, R.D. Braatz
Institution: University of Illinois Urbana-Champaign
Language: English
Subfield: Control and Systems Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2147973136