Work

Optimal interconnection circuits for VLSI

Year: 1985

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/t-ed.1985.22046

Authors: H.B. Bakoglu, J.D. Meindl

Institution: Stanford University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2151817873

FWCI: 5.203

Cites: 25

Cited by: 428

Related to: 9