Wavelength considerations in soft-x-ray projection lithography
Year: 1993
Type: article
Source: Applied Optics
DOI: 10.1364/ao.32.007062
Authors: Andrew M. Hawryluk, Natale M. Ceglio
Institution: Lawrence Livermore National Laboratory
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2153896914