Work

Investigations of the Adhesion of Maleic Anhydride/Cyclic Olefin Alternating Copolymers to Silicon Substrates: Improved Materials for 193 nm Lithography

Year: 2002

Type: article

Source: The Journal of Adhesion

DOI: 10.1080/00218460210378

Authors: Anthony J. Pasquale, Timothy E. Long, Hoa Truong, Robert D. Allen

Institutions: Virginia Tech, IBM Research - Almaden

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2155987412

FWCI: 0.7

Cites: 30

Cited by: 8

Related to: 10