Work

Dependence of Buried CoSi2 Resistivity on ION Implantation and Annealing Conditions1

Year: 1991

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-235-285

Authors: Fereydoon Namavar, N. M. Kalkhoran, J. M. Manke, L. Luo, J. T. McGinn

Institutions: Spire Corporation (United States), Los Alamos National Laboratory, Princeton University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2156865010

FWCI: 0.916

Cites: 9

Cited by: 5

Related to: 10