Work

Ultrathin membrane masks for electron projection lithography

Year: 2004

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1802911

Authors: O. R. Wood, W. J. Trybula, J. Greschner, S. Kalt, T. Bayer, S. Shimizu, H. Yamamoto, K. Suzuki, M. S. Gordon, C. F. Robinson, R. S. Dhaliwal, C. W. Thiel, N. Caldwell, M. S. Lawliss, C. Huang

Institutions: Nikon (Japan), IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2157901844

FWCI:

Cites: 9

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Related to: 10