Work

Silicone substrate with in situ strain relief for stretchable thin-film transistors

Year: 2011
Type: article
Abstract: We have manufactured stretchable thin-film transistors and interconnects directly onto an engineered silicone matrix with localized and graded mechanical compliance. The fabrication only involves planar and standard processing. Brittle active device materials are patterned on non deformable elastomer regions (strain <1% at all times) while interconnects run smoothly from “stiff” to “soft” elastomer. Pentacene thin-film transistors sustain applied strain up to 13% without electrical degradation and mechanical fracture. This integrated approach opens promising options for the manufacture of physically adaptable and transformable circuitry.
Language: English
Open Access status: bronze
OpenAlex ID: W2158311275
FWCI: 5.851
Cites: 13
Cited by: 114
Related to: 10