Work

Ionized physical vapor deposition (IPVD): A review of technology and applications

Year: 2006

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2006.03.033

Authors: Ulf Helmersson, Martina Lattemann, Johan Bohlmark, Arutiun P. Ehiasarian, Jon Tomas Gudmundsson

Institutions: Linköping University, Sheffield Hallam University, University of Iceland

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2161508873

FWCI: 36.88

Cites: 168

Cited by: 1,116

Related to: 10