Degradation of Amorphous Silicon Thin Film Transistors Under Negative Gate Bias Stress
Year: 2011
Type: article
Authors: Dapeng Zhou, Mingxiang Wang, Shengdong Zhang
Institutions: Soochow University, Peking University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2162470823