Work

Achieving Resolution Far Beyond the Diffraction Limit with RAPID Photolithography

Year: 2009

Type: conference-paper

Source: Conference on Lasers and Electro-Optics

DOI: 10.1364/cleo.2009.cpda1

Authors: Linjie Li, Rafael R. Gattass, Erez Gershgoren, John T. Fourkas

Institution: University of Maryland, College Park

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2162732738

FWCI:

Cites: 4

Cited by: 1

Related to: 10