Work

Fundamentals of Slurry Design for CMP of Metal and Dielectric Materials

Year: 2002

Type: article

Source: MRS Bulletin

DOI: 10.1557/mrs2002.245

Authors: Rajiv K. Singh, Seung-Mahn Lee, Kyu-Se Choi, G. Bahar Basim, Wonseop Choi, Zhan Chen, Brij M. Moudgil

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, University of Florida

OpenAlex ID: W2163249050

FWCI: 8.334

Cites: 30

Cited by: 87

Related to: 10