Year: 2010
Type: article
Abstract: Graphene ranks highly as a possible material for future high-speed and flexible electronics. Current fabrication routes, which rely on metal substrates, require post-synthesis transfer of the graphene onto a Si wafer, or in the case of epitaxial growth on SiC, temperatures above 1000 degrees C are required. Both the handling difficulty and high temperatures are not best suited to present day silicon technology. We report a facile chemical vapor deposition approach in which nanographene and few-layer nanographene are directly formed over magnesium oxide and can be achieved at temperatures as low as 325 degrees C.
Source: ACS Nano
DOI: 10.1021/nn100971s
Authors: Mark H. Rümmeli, Alicja Bachmatiuk, Andrew Scott, Felix Börrnert, Jamie H. Warner, Volker Hoffman, Jarrn-Horng Lin, Gianaurelio Cuniberti, Bernd Büchner
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
Funder: Freistaat Sachsen
OpenAlex ID: W2163306381
