Virtual Museum Exhibition Designer Using Enhanced ARCO Standard
Year: 2010
Type: conference-paper
DOI: 10.1109/sccc.2010.11
Authors: Daniel Biella, Wolfram Luther, Nelson Baloian
Institutions: University of Duisburg-Essen, University of Chile
Language: English
Subfield: Museology
Field: Arts and Humanities
Domain: Social Sciences
Open Access status: closed
OpenAlex ID: W2166067446