Work

Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography

Year: 2000

Type: article

Source: Advanced Materials

DOI: 10.1002/1521-4095(200008)12:15<1118::aid-adma1118>3.0.co;2-i

Authors: D. C. Tully, A. R. Trimble, J. M. J. Fréchet

Institution: University of California, Berkeley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2167256343

FWCI: 3.459

Cites:

Cited by: 87

Related to: 10