Work

Pair diffusion and kick‐out: Contributions to diffusion of boron in silicon

Year: 2004

Type: article

Source: AIChE Journal

DOI: 10.1002/aic.10220

Authors: M. Y. L. Jung, R. Gunawan, R. D. Braatz, E. G. Seebauer

Institutions: University of Illinois Urbana-Champaign, University of Illinois System

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2167602060

FWCI: 3.907

Cites: 52

Cited by: 33

Related to: 10