Work

Block Copolymer Thin Films: Physics and Applications

Year: 2001

Type: review

Source: Annual Review of Materials Research

DOI: 10.1146/annurev.matsci.31.1.323

Authors: Michael J Fasolka, Anne M Mayes

Institutions: National Institute of Standards and Technology, Massachusetts Institute of Technology

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2168443976

FWCI: 4.15

Cites: 155

Cited by: 912

Related to: 10