Work

Programmable Self-Aligning Ferrofluid Masks for Lithographic Applications

Year: 2004

Type: article

Source: IEEE Transactions on Magnetics

DOI: 10.1109/tmag.2004.829836

Authors: B.B. Yellen, G. Friedman, K.A. Barbee

Institution: Drexel University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, American Society for Engineering Education, National Defense Science and Engineering Graduate

OpenAlex ID: W2171966800

FWCI: 1.962

Cites: 9

Cited by: 18

Related to: 10