STUDY OF ANNEALING TEMPERATURE VARIATION ON THE STRUCTURAL PROPERTIES OF DIP-COATED TiO 2 -SiO 2 NANOSTRUCTURED FILMS
Year: 2013
Type: article
Abstract: In the present research, SiO 2 -TiO 2 nanostructure films were successfully prepared on windshields using the sol-gel technique for photocatalytic applications. To prevent the thermal diffusion of the sodium ions from the glass to TiO 2 films, the SiO 2 layer was pre-coated on the glass by the sol-gel method. The substrates were dipped in the sol and withdrawn with the speed of 6cm/min-1 to make a gel coating film. The coated films were dried for 2 days at 27 °C to allow slow solvent evaporation and condensation reactions due to rapid sol-gel reaction of Titania precursor. Then, the films were annealed at 100 °C for 30min and at the final temperature (500, 700 °C) for 30 min continuously. The structure and surface morphology properties, which are as a function of annealing temperature, have been studied by SEM; FE-SEM and XRD. The FE-SEM surface morphology results indicate that the particle size increases from 19 to 42 nm by increasing the annealing temperature from 500 °C to 700 °C. Likewise, XRD illustrate the crystal anatase and rutile as main phases for TiO 2 -SiO 2 films annealed at 500 °C and 700 °C respectively. This procedure resulted in transparent, crack-free SiO 2 -TiO 2 films.
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W2183964915