Work

A Coupled Electromagnetic and Thermal Model for Picosecond and Nanometer Scale Plasmonic Lithography Process

Year: 2014

Type: article

Source: Journal of Micro and Nano-Manufacturing

DOI: 10.1115/1.4027589

Authors: Ion-Hong Chao, Liang Pan, Cheng Sun, Xiang Zhang, Adrienne S. Lavine

Institutions: University of California, Los Angeles, Purdue University West Lafayette, Northwestern University, University of California, Berkeley

Language: English

Topic: Plasmonic and Surface Plasmon Research

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2115445386

FWCI: 1.069

Cites: 16

Cited by: 9

Related to: 10