Work

Finite Ground Coplanar lines on CMOS grade silicon with a thick embedded silicon oxide layer using micromachining techniques

Year: 2004

Type: conference-paper

Source: European Microwave Conference (EuMC)

DOI: 10.1109/eumc.2003.1262209

Authors: Guoan Wang, R. Abdolvand, F. Ayazi, J. Papapolymerou, E.M. Tentzeris

Institution: Georgia Institute of Technology

Language: English

Topic: Microwave Engineering and Waveguides

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2188656786

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Cites: 9

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Related to: 10